Comparison study of N‐ and In‐polar {0001} InN layers grown by MOVPE
Comparison study of N‐ and In‐polar {0001} InN layers grown by MOVPE
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MOVPE 生长的 N 极性和 In 极性 {0001} InN 层的比较研究
DOI:
10.1002/pssc.201100093
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发表时间:
2012
期刊:
影响因子:
--
通讯作者:
M. Kneissl
中科院分区:
文献类型:
--
作者:
D. V. Dinh;M. Pristovsek;S. Solopow;D. Skuridina;M. Kneissl
We compare InN layers grown directly on c -plane (0001) sapphire and on (0001) GaN templates using metal-organic vapor phase epitaxy. InN grown on nitridated c -plane sapphire showed N-polarity, while InN grown on c -plane GaN templates showed In-polarity. N-polar and In-polar InN layers showed different surface morphology and crystallinity. N-polar InN was smoothest when grown at higher growth temperatures, while In-polar InN was smoothest at intermediate growth temperatures. Growth mode of the N-polar InN on sapphire is Frank-Van der Merwe, while growth mode of the In-polar InN on GaN templates is Volmer-Weber. Electrical properties were similar for both layers. Lowtemperature photoluminescence of In-polar InN layers is shifted to higher energies most likely due to biaxial compressive stresses. (© 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)