X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES OF THIN-FILM OXIDES OF COBALT AND MOLYBDENUM

X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES OF THIN-FILM OXIDES OF COBALT AND MOLYBDENUM
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DOI:
10.1002/sia.740150406
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发表时间:
1990-04-01
影响因子:
1.7
通讯作者:
BROWN, JR
BROWN, JR
中科院分区:
化学4区
文献类型:
--
作者:
MCINTYRE, NS;JOHNSTON, DD;BROWN, JR

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用X射线光电子能谱(XPS)研究了钴、钼及钴钼混合金属的表面氧化反应。通过XPS强度测量确定了氧化物的化学计量比。这种定量在用特征XPS光谱鉴定氧化物成分方面很重要。一些离散的二元钼氧化物在2 0 0°C和压力从1 atm到10−6pa的范围内反应后被表征。在最低压力下,Mo-3d谱和O/Mo比表明形成了化学计量比接近1的钼-氧结构。相比之下,在较高的压力下,会出现以MoO2和MoO3为主的氧化物,但也发现了其他中间氧化物结构。在不同压力的氧气中加热后,可以从金属钴中制备出定义明确的二元氧化物钴。在MoO_3或Co_3O_4衬底上反应生成了新的钴、钼二元氧化物。在Co3O4衬底上氧化一层钼薄膜可以生成接近化学计量比的CoMoO4表层。该方法可用于生产其他可能感兴趣的用作XPS标准物质的三元氧化物。
Surface oxidation reactions of cobalt, molybdenum and mixed cobalt–molybdenum metals have been investigated using x‐ray photoelectron spectroscopy (XPS). The oxide stoichiometries have been determined from XPS intensity measurements. Such quantification has been important in identifying oxide compositions with characteristic XPS spectra. A number of discrete binary molybdenum oxides have been characterized after reactions at 200°C and pressures ranging from 1 atm to 10−6Pa. At the lowest pressure, the Mo 3d spectra and O/Mo ratios suggest the formation of a molybdenum–oxygen structure with a stoichiometry near unity. By contrast, at higher pressures, oxides that are predominantly MoO2and MoO3appear, but other intermediate oxide structures are also identified. Well‐defined binary oxides of cobalt can be prepared from cobalt metal after heating in oxygen at different pressures. New binary oxides of cobalt and molybdenum have been generated by the reaction on MoO3or Co3O4substrates. Oxidation of a thin film of molybdenum on a Co3O4substrate has been shown to produce a nearly stoichiometric surface layer of CoMoO4. The procedure could be useful for the production of other ternary oxides of possible interest for use as XPS reference materials.