Functional Plasmonic Nanocircuits with Low Insertion and Propagation Losses

Functional Plasmonic Nanocircuits with Low Insertion and Propagation Losses
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DOI:
10.1021/nl402580c
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发表时间:
2013-09-01
期刊:
影响因子:
10.8
通讯作者:
Peschel, Ulf
Peschel, Ulf
中科院分区:
材料科学1区
文献类型:
--
作者:
Kriesch, Arian;Burgos, Stanley P.;Peschel, Ulf

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