Effects of Sc addition and aging on microstructure and martensitic transformation of Ni-rich NiTiHfSc high temperature shape memory alloys
Effects of Sc addition and aging on microstructure and martensitic transformation of Ni-rich NiTiHfSc high temperature shape memory alloys
复制标题
Sc添加和时效对富镍NiTiHfSc高温形状记忆合金显微组织和马氏体相变的影响
DOI:
10.1016/j.jallcom.2020.156331
复制
发表时间:
2020-12
影响因子:
6.2
通讯作者:
Y. F. Zheng
中科院分区:
文献类型:
--
作者:
Y. X. Tong;X. M. Fan;A. V. Shuitcev;F. Chen;B. Tian;L. Li;Y. F. Zheng
In this study, the effects of Sc addition and aging on the microstructure and martensitic transformation of Ni50.3Ti29.7-xHf20Scx(x = 0, 0.5, 1, and 2 at.%) alloys were investigated. The addition of Sc resulted in the formation of Sc2O3phase along with the martensite and (Ti,Hf)4Ni2Oxat room temperature. The Ni content of the matrix increased slightly with an increase in the Sc content up to 1 at.% and then decreased with a further increase in the Sc content to 2 at.%. The transformation temperature of the solution-treated NiTiHfSc alloys first increased at a rate of 52 °C/1 at.% Sc and then decreased at a rate of 42 °C/1 at.% Sc. The effect of aging at 550 °C for 3 h on the precipitation of the H-phase in the alloys depended on their Sc content. With an increase in the Sc content, the volume fraction of the H-phase first decreased and then increased attributing to the Ni content in the matrix and the evolution of the secondary phase. After aging, the characteristic temperatures of martensitic transformation were elevated as compared to those of solution-treated alloys because of the precipitation of the H-phase. With an increase in the Sc content up to 1 at.%, the increment in transformation temperature was first reduced and then increased with further increasing Sc content to 2 at.%. This can be attributed to the change in the H-phase volume fraction with the Sc content.
登录
查看更多内容
影响因子:
4.4
作者:
K. Ramaiah;C. Saikrishna;J. Bhagyaraj;Gouthama;S. Bhaumik
通讯作者:
K. Ramaiah;C. Saikrishna;J. Bhagyaraj;Gouthama;S. Bhaumik
影响因子:
6.2
作者:
X.M. Fan;S.Y. Sun;Y. X. Tong;L. Li;B. Tian;F. Chen;Y. F. Zheng
通讯作者:
Y. F. Zheng
影响因子:
9.4
作者:
F. Dalle;E. Perrin;P. Vermaut;M. Masse;R. Portier
通讯作者:
F. Dalle;E. Perrin;P. Vermaut;M. Masse;R. Portier
DOI:
--
发表时间:
2019-05
期刊:
--
影响因子:
--
作者:
Y. Tong
通讯作者:
Y. Tong
影响因子:
3.6
作者:
佟运祥;亚历山大;郑玉峰
通讯作者:
郑玉峰