Automated simulation of 3-D crack propagation on bimaterial interfaces in semiconductor packages
Automated simulation of 3-D crack propagation on bimaterial interfaces in semiconductor packages
复制标题
自动模拟半导体封装中双材料界面上的 3D 裂纹扩展
DOI:
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发表时间:
2003
期刊:
影响因子:
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通讯作者:
A. F. Herr
中科院分区:
文献类型:
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作者:
A. F. Herr
The numerical simulation of the propagation of an arbitrary, three-dimensional crack can be a tedious, time-consuming process. This is especially true for 3-D cracks propagating on interfaces between various electronic materials in semiconductor packages. In addition to accurately account for the peculiar nature of the crack tip stress field associated with interface cracks, systematically “advancing” the crack must be based on an efficient numerical crack advance algorithm. In this study, a technique is described that combines the use of ANSYS finite element software and a specialized finite element program, FRAC3D, developed at Lehigh University, to simulate crack front propagation for arbitrary 3-D cracks. This method uses the classical fatigue crack growth rate “law” developed by Paris and Erdogan to simulate stable crack growth under cyclic loading conditions. As a practical example in reliability analysis, the method is applied to a semiconductor package with a propagating corner-crack. The results are compared to photographs of a similar failure observed in actual semiconductor packages. SRC Grant 826.002