High‐conductivity amorphous TiSi substrates for low‐temperature electron microscopy
High‐conductivity amorphous TiSi substrates for low‐temperature electron microscopy
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用于低温电子显微镜的高导非晶硅钛基底
DOI：
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发表时间：
1992
期刊：
影响因子：
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通讯作者：
M. Lamvik
中科院分区：
文献类型：
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作者：
R. S. Rader;M. Lamvik
为了避免静电充电的问题，在通过电子显微镜观察非导电有机样品时，必须使用导电样品支撑膜或涂层。在室温下，显微镜通常使用碳膜或碳涂层塑料膜作为样品基底。此类薄膜也已用于低温显微镜。最近的测量表明，传统的碳膜在低温下具有高电阻率。薄的钛膜已被用于提供改善的导电性，但钛膜的结构对于高分辨率电子显微镜来说是过度颗粒化的。希望解决这两个问题，薄膜的Ti 88 Si 12已使用标准的蒸发系统。电子显微镜、电子衍射和差示扫描量热分析表明，沉积的薄膜为非晶态。二元合金膜的电导率几乎与纯钛膜一样高。因此，这些薄膜似乎是低温电子显微镜的合适基底。
To avoid problems with electrostatic charging, electrically conductive specimen support films or coatings must be used when observing non‐conductive organic specimens by electron microscopy. At room temperature, microscopists typically use either carbon films or carbon‐coated plastic films as specimen substrates. Such films have also been adopted for low‐temperature microscopy. Recent measurements have shown that conventional carbon films have high electrical resistivity at low temperature. Thin titanium films have been used to provide improved electrical conductivity, but the structure of titanium films is excessively granular for high‐resolution electron microscopy. With the hope of solving both problems, thin films of Ti88Si12 have been produced using a standard evaporation system. The deposited films are amorphous, as shown by electron microscopy, electron diffraction and differential scanning calorimetry. The electrical conductivity of the binary alloy films is nearly as high as that of pure titanium films. Therefore, these films appear to be appropriate substrates for low‐temperature electron microscopy.