Fabrication of high-aspect-ratio metallic nanostructures using nanoskiving.
Fabrication of high-aspect-ratio metallic nanostructures using nanoskiving.
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DOI：
10.1021/nl0615672
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发表时间：
2006-07
期刊：
影响因子：
10.8
通讯作者：
Qiaobing Xu;R. Perez-Castillejos;Zhefeng Li;G. Whitesides
中科院分区：
文献类型：
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作者：
Qiaobing Xu;R. Perez-Castillejos;Zhefeng Li;G. Whitesides
本通讯描述了具有40纳米壁厚和高达25的高纵横比的金结构（例如，环）的制造。该技术将金属薄膜沉积在地形图案化的环氧基板上，并在与图案化基板平行的平面上使用显微切片机进行纳米级切片。金属结构的尺寸由金属膜的厚度和环氧树脂截面的厚度决定。所得到的纳米结构的形状由原始模板的横截面定义。
This communication describes the fabrication of gold structures (for example, rings) with wall thickness of 40 nm, and with high aspect ratios up to 25. This technique combines thin-film deposition of metal on a topographically patterned epoxy substrate, with nanometer-scale sectioning using a microtome in a plane parallel to the patterned substrate. The dimensions of the metal structures are determined by the thickness of the metal film and the thickness of the epoxy sections. The shape of the resulting nanostructure is defined by the cross section of the original template.