Rapid fabrication of nanoneedle arrays by ion sputtering
Rapid fabrication of nanoneedle arrays by ion sputtering
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DOI：
10.1088/0957-4484/19/01/015303
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发表时间：
2008-01
期刊：
影响因子：
3.5
通讯作者：
Yizhong Huang;D. Cockayne;Jausovec Ana-Vanessa;R. Cowburn;Shou-guo Wang;R. Ward
中科院分区：
文献类型：
--
作者：
Yizhong Huang;D. Cockayne;Jausovec Ana-Vanessa;R. Cowburn;Shou-guo Wang;R. Ward
我们报道了一种快速制备有序纳米针的新方法，该方法利用离子束穿过Fe/GaAs单层或Fe/MgO/Fe/GaAs多层膜，产生柱状图案，然后垂直于图案区进行光栅扫描。然而，当使用这种方法时，在没有Fe薄膜涂层的纯GaAs衬底表面没有形成这种有序的纳米针，在涂有薄的Cr外延膜的GaAs衬底上也没有形成纳米针。与其他方法相比，它具有简单、快速和可控的一维纳米结构阵列的优点，导致了一系列的应用，如原子力显微镜/原子探针的高深宽比尖端以及由此可能产生的量子限制效应或用于场光学/光致发光发射和数据记录的纳米结构阵列。
We report a novel method for rapidly fabricating ordered nanoneedles using an ion beam that cuts through the Fe/GaAs single thin layer or the Fe/MgO/Fe/GaAs multilayer producing a pillar pattern followed by raster-scanning normal to the patterned area. However, such ordered nanoneedles were not formed on the pure GaAs substrate surface without the thin Fe film coating, nor were nanoneedles formed on the GaAs substrate coated with a thin Cr epitaxial film, when this method was used. It has advantages over other methods, being simple, fast and well controlled for fabricating one-dimensional nanostructure arrays, leading to a range of applications such as high aspect ratio sharp tips for atomic force microscope/atom probes and consequent possible quantum confinement effects or arrays of nanostructures for field-optical/photoluminescence emission and data recording.