Low-coherence interferometry-based non-contact temperature monitoring of a silicon wafer and chamber parts during plasma etching
Low-coherence interferometry-based non-contact temperature monitoring of a silicon wafer and chamber parts during plasma etching
复制标题
等离子蚀刻过程中基于低相干干涉测量的硅晶圆和腔室部件的非接触式温度监测
作者：
C.Koshimizu;T.Ohta;T.Matsudo;S.Tuchitani;M.Ito
