Ion-beam characteristics of novel helicon ion sources for different plasma parameters

Ion-beam characteristics of novel helicon ion sources for different plasma parameters
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不同等离子体参数下新型螺旋离子源的离子束特性

DOI:
10.1063/1.1150467
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发表时间:
2000
影响因子:
1.6
通讯作者:
W. Choe
W. Choe
中科院分区:
工程技术4区
文献类型:
--
作者:
I. Hong;Y. Hwang;G. H. Lee;Doyeon Kim;Hyun;G. Eom;W. Choe

文献摘要

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高电流离子源需要高密度等离子体源来提供足够的待加速离子。针对连续高功率离子源,研制了一种新概念的螺旋等离子体源。以非常高的功率效率产生紧凑的高密度螺旋等离子体,并且从等离子体源提取离子束。本文首次研究了不同等离子体参数条件下螺旋管离子源引出离子束的特性。等离子体参数,特别是等离子体密度,被证明是强烈相关的提取的光束特性。
A high-current ion source requires a high-density plasma source to provide sufficient ions to be accelerated. For a continuous high-power ion source, a new concept ion source using a helicon plasma source has been developed. A compact high-density helicon plasma is generated with very high-power efficiency, and ion beams are extracted from the plasma source. With various plasma parameters, extracted ion-beam characteristics are studied in a helicon ion source for the first time. Plasma parameters, especially plasma density, are shown to be strongly correlated with the extracted beam characteristics.