Antiadhesion Surface Treatments of Molds for High‐Resolution Unconventional Lithography
Antiadhesion Surface Treatments of Molds for High‐Resolution Unconventional Lithography
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用于高分辨率非常规光刻的模具的防粘表面处理
DOI：
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发表时间：
2006
期刊：
影响因子：
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通讯作者：
Youn Sang Kim
中科院分区：
文献类型：
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作者：
M. Lee;N. Y. Lee;Ju Ri Lim;Jong Bok Kim;Mihee M. Kim;H. Baik;Youn Sang Kim
需要一种新的策略来在各种各样的基底上大规模生产微和纳米结构，其可以应用于各种制造领域，例如微电子学、微光学、光子学以及化学或生物传感器。自20世纪90年代初以来，已经开发了简单的非常规光刻技术，例如软光刻，[1-3]压印光刻[4，5]和其他[6-11]，用于经济和快速制造适用于电子和光学各个领域的微米和纳米结构。然而，随着特征尺寸的迅速减小，仍然需要克服的巨大挑战是制造具有高纵横比的致密和复杂的纳米结构，并且在该过程中，实现模具从图案化基底的完全释放变得至关重要。出于这个原因，许多研究努力针对降低模具与衬底上的图案化聚合物之间的粘附性。在这里，我们介绍了一种新的策略，以实现简单，快速的制造和复制的纳米结构的高保真度，适用于所有类型的冲压模具的抗粘附表面。在这项研究中，各种硬模具和软模具的表面与低粘度聚二甲基硅氧烷（PDMS）牢固地共价结合，PDMS具有良好的表面性能，适用于模塑过程，即，低表面能和低粘附性能，与普通PDMS模具一样。表面改性的完成与构成模具的基本材料无关。特别地，为了显示涂覆的PDMS层的抗粘附效果，使用一般的UV可固化的聚合物从SiO2纳米结构复制具有纳米级特征的模具。
A new strategy is needed for the mass production of micro-and nanostructures on a wide variety of substrates, which can be applied in various fields of manufacturing, for example, microelectronics, micro-optics, photonics, and chemical or bio-sensors. Since the early 1990s, simple unconventional lithographic techniques, such as soft lithography, [1–3] imprint lithography, [4,5] and others, [6–11] have been developed for the economical and rapid fabrication of micro-and nanostructures applicable to various fields of electronics and optics. However, as the feature size diminishes rapidly, a grand challenge that remains to be overcome is the fabrication of dense and complex nanostructures with high aspect ratios, and, in this process, accomplishing the complete release of the mold from the patterned substrate becomes essential. For this reason, many research efforts are directed towards lowering the adhesion between the mold and the patterned polymer on a substrate. Here, we introduce a new strategy to achieve an antiadhe-sion surface for the simple, rapid fabrication and replication of nanostructures with high fidelity that is applicable to all types of stamping molds. In this study, the surface of various hard and soft molds was bound strongly and covalently with low-viscosity poly(dimethylsiloxane) (PDMS), which has good surface properties for the molding process, i.e., low surface energy and low adhesion properties, like normal PDMS molds. The surface modification was accomplished irrespective of the basic materials comprising the mold. In particular, to show the antiadhesion effect of the coated PDMS layer, molds with nanoscale features were replicated from SiO 2 nanostructures using general UV-curable