TFT-LCD technology

TFT-LCD technology
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DOI：
10.1016/s0040-6090(98)01519-3
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发表时间：
1999-03-12
期刊：
THIN SOLID FILMS
影响因子：
2.1
通讯作者：
Katayama, M
Katayama, M
中科院分区：
材料科学3区
文献类型：
--
作者：
Katayama, M

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本文讨论了目前为实现高性能显示器而发展的TFT阵列工艺技术，特别是低电阻金属形成总线的技术、高开口率面板的技术和宽视角面板的技术。此外，13.8英寸对角线的“超级V”TFT-LCD利用这些技术也进行了讨论。(C)1999年由Elsevier Science S.A.出版All rights reserved.
In this paper, the present technologies of TFT array processes which are developed to realize high performance displays, especially the technology of forming buslines with low resistive metals, the technology for a panel with a high aperture ratio, and the technology for a panel with wide viewing angle, are discussed. Moreover, 13.8 inch diagonal 'Super V' TFT-LCDs making advantage of these technologies are also discussed. (C) 1999 Published by Elsevier Science S.A. All rights reserved.