Physics on development of open-air atmospheric pressure thin film fabrication technique using mist droplets: Control of precursor flow
Physics on development of open-air atmospheric pressure thin film fabrication technique using mist droplets: Control of precursor flow
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DOI：
10.7567/jjap.53.05ff08
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发表时间：
2014-05-01
影响因子：
1.5
通讯作者：
Kawaharamura, Toshiyuki
中科院分区：
文献类型：
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作者：
Kawaharamura, Toshiyuki
喷雾CVD是在露天大气压下进行的功能性薄膜制造方法之一，已开发用于先进控制前体流以实现均匀薄膜的制造。为了获得包括雾滴的均匀流，已经考虑了碰撞混合，并且已经使用该技术开发了细通道（FC）喷嘴。在FC中，雾滴受到朝向基板方向的升力的影响，整个区域的气体温度达到恒定，并且由于莱顿弗罗斯特效应，雾滴的蒸发时间非常长，为几百毫秒，并且雾滴的迁移延伸到几百毫米的距离。根据FC中的这些特征现象，使用FC型雾（FCM-）CVD系统实现了在整个表面上形成均匀薄膜。(C)2014日本应用物理学会
Mist CVD, which is one of the functional thin-film fabrication methods carried out under open-air atmospheric pressure, has been developed for advanced control of precursor streams in order to achieve the fabrication of uniform thin films. In order to obtain a uniform stream of flow including mist droplets, collisional mixing has been considered, and a fine channel (FC) nozzle has been developed using this technology. In the FC, mist droplets are affected by the lift forces toward the direction of the substrate, the gas temperature of the entire area reaches a constant, and owing to the Leidenfrost effect, the evaporation time of a mist droplet is remarkably long as several hundred milliseconds and the migration of a mist droplet extends to a distance of several hundred millimeters. From these characteristic phenomena in the FC, the formation of uniform thin films on the entire surface has been achieved using the FC-type mist (FCM-) CVD system. (C) 2014 The Japan Society of Applied Physics