Cryogenic probe station for on-wafer characterization of electrical devices
Cryogenic probe station for on-wafer characterization of electrical devices
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DOI:
10.1063/1.3700213
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发表时间:
2012-04-01
影响因子:
1.6
通讯作者:
Reevesc, Rodrigo
中科院分区:
文献类型:
--
作者:
Russell, Damon;Cleary, Kieran;Reevesc, Rodrigo
A probe station, suitable for the electrical characterization of integrated circuits at cryogenic temperatures is presented. The unique design incorporates all moving components inside the cryostat at room temperature, greatly simplifying the design and allowing automated step and repeat testing. The system can characterize wafers up to 100 mm in diameter, at temperatures