MOVPE growth and characterization of quaternary Ga(PAsBi)/GaAs alloys for optoelectronic applications
MOVPE growth and characterization of quaternary Ga(PAsBi)/GaAs alloys for optoelectronic applications
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DOI:
10.1016/j.apmt.2016.09.018
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发表时间:
2016-12
影响因子:
8.3
通讯作者:
L. Nattermann;P. Ludewig;Nikolai Knaub;N. Rosemann;T. Hepp;E. Sterzer;S. Jin;K. Hild;S. Chatterjee;S. Sweeney;W. Stolz;K. Volz
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文献类型:
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作者:
L. Nattermann;P. Ludewig;Nikolai Knaub;N. Rosemann;T. Hepp;E. Sterzer;S. Jin;K. Hild;S. Chatterjee;S. Sweeney;W. Stolz;K. Volz
Dilute bismide Ga(PAsBi)-based structures are promising candidates for highly efficient optoelectronic applications, like the 1 eV sub-cell in multi-junction solar cells or the active region in infra-red laser diodes. The band gap can be tuned independently from the lattice constant, which theoretically enables the deposition of lattice-matched layers in a wide range of band gap energies on GaAs substrate. In this work, firstly, the shifts in the band edge positions as a function of composition that are possible with the Ga(PAs(Bi)) alloy were estimated using the virtual crystal approximation and valence band anti-crossing theory. Secondly, systematic investigations on MOVPE growth of Ga(PAsBi) layers are presented. Finally, we show the first photoluminescence activity of quaternary Ga(PAsBi) and compare the experimental results to theory.