Nanometer definition of atomic beams with masks of light
Nanometer definition of atomic beams with masks of light
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DOI：
10.1109/iqec.1998.680343
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发表时间：
1997-12
期刊：
影响因子：
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通讯作者：
R. Abfalterer;S. Bernet;C. Keller;M. Oberthaler;J. Schmiedmayer;A. Zeilinger
中科院分区：
文献类型：
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作者：
R. Abfalterer;S. Bernet;C. Keller;M. Oberthaler;J. Schmiedmayer;A. Zeilinger
制备和测量纳米分辨率的原子分布的有效方法在原子光学以及在科学和技术上的可能应用方面特别令人感兴趣。一种用途广泛且特别有用的工具是吸收掩模，它既可以用来写入，也可以用来探测精细结构。我们将吸波面罩的优点与轻型结构的灵活性结合在一起。我们报道了完全由光组成的中性原子在纳米分辨率下实现了定义良好的吸收掩模。
Efficient methods to prepare and measure atomic distributions with nanometer resolution are of particular interest in atom optics and for possible applications in science and technology. A versatile and particularly useful tool is absorptive masks, which can be used both to write and to probe fine structures. We combine the advantages of absorptive masks with the flexibility of light structures. We report the realization of well-defined absorptive masks at nanometer resolution for neutral atoms, which are entirely made of light.