Detailed structure analysis of deposit layer in TEXTOR by means of TEM techniques
Detailed structure analysis of deposit layer in TEXTOR by means of TEM techniques
复制标题
利用 TEM 技术对 TEXTOR 中的沉积层进行详细结构分析
DOI：
10.1016/s0022-3115(00)00576-6
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发表时间：
2001
影响因子：
3.1
通讯作者：
T. Tanabe
中科院分区：
文献类型：
--
作者：
S. Muto;N. Yokoya;T. Tanabe
本文用透射电子显微镜（TEM）、电子衍射、电子能量损失谱（EELS）及其结合的方法，详细研究了TEXTOR主石墨带限制器（ALT-II）上的存款层结构。该层主要由无定形碳基体和高密度的结晶硼沉淀物组成。无定形碳基体的特征在于平行于限制块表面的伪二维石墨平面的堆叠，含有相当数量的硼溶解。这种存款的性质似乎非常类似于掺硼石墨经H+辐照。
We examined in detail the structure of the deposit layer on the main graphite belt limiter (ALT-II) in TEXTOR by means of transmission electron microscopy (TEM), electron diffraction, electron energy-loss spectroscopy (EELS) and their combination. The layer consisted mainly of an amorphous carbon matrix and a high density of crystalline boron precipitates. The amorphous carbon matrix was characterized by the stacking of pseudo-two-dimensional graphitic planes parallel to the surface of the limiter block, containing a considerable amount of boron solved. This character of deposit seems very similar to B-doped graphite irradiated by H+.