Thermal stability of magnetic tunnel junctions studied by x-ray photoelectron spectroscopy

Thermal stability of magnetic tunnel junctions studied by x-ray photoelectron spectroscopy
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X射线光电子能谱研究磁隧道结的热稳定性

DOI：
10.1063/1.1338957
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发表时间：
2001
期刊：
影响因子：
--
通讯作者：
J. Slaughter
J. Slaughter
中科院分区：
--
文献类型：
--
作者：
D. Keavney;S. Park;C. Falco;J. Slaughter

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我们研究了沉积薄膜中和沉积后退火后 NiFe/Al 氧化物/NiFe 隧道结结构中金属层化学状态的演变。沉积薄膜中的顶部和底部 NiFe 层都显示出明显的 Fe 氧化，但没有 Ni 氧化。这种 Fe 在退火样品中被还原，这意味着氧从 FeNi 层迁移，可能进入 Al 氧化物层。我们还发现，即使在最佳退火的薄膜中，顶部和底部电极也被显着氧化。
We have studied the evolution of chemical state of the metallic layers in NiFe/Al oxide/NiFe tunnel junction structures in as-deposited films and after postdeposition annealing. Both top and bottom NiFe layers in as-deposited films show significant Fe oxidation, but no Ni oxidation. This Fe is reduced in annealed samples, implying that oxygen migrates from the FeNi layers, possibly into the Al oxide layer. We also find that both top and bottom electrodes are significantly oxidized even in optimally annealed films.