Unveiling the mechanisms of dressed-photon–phonon etching based on hierarchical surface roughness measure
Unveiling the mechanisms of dressed-photon–phonon etching based on hierarchical surface roughness measure
复制标题
揭示基于分级表面粗糙度测量的修饰光子-声子蚀刻机制
DOI：
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发表时间：
2013
期刊：
影响因子：
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通讯作者：
M. Ohtsu
中科院分区：
文献类型：
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作者：
M. Naruse;T. Yatsui;W. Nomura;T. Kawazoe;M. Aida;M. Ohtsu
修饰光子声子(DPP)刻蚀是材料表面平面化的一种破坏性技术，因为它完全消除了机械接触过程。然而，用于评估表面粗糙度的足够的指标和潜在的物理机制仍然没有被很好地理解。这里，我们提出了一种受Allan方差启发的二维分级表面粗糙度度量，它在保持原始二维表面拓扑结构的同时，代表了DPP刻蚀的有效性。此外，我们还建立了一个简单的DPP刻蚀物理模型，该模型与实验观测结果符合得很好，清楚地表明了修饰光子或光学近场的内在分层性质在表面处理中的参与。
Dressed-photon–phonon (DPP) etching is a disruptive technology in planarizing material surfaces because it completely eliminates mechanical contact processes. However, adequate metrics for evaluating the surface roughness and the underlying physical mechanisms are still not well understood. Here, we propose a two-dimensional hierarchical surface roughness measure, inspired by the Allan variance, that represents the effectiveness of DPP etching while conserving the original two-dimensional surface topology. Also, we build a simple physical model of DPP etching that agrees well with the experimental observations, which clearly shows the involvement of the intrinsic hierarchical properties of dressed photons, or optical near-fields, in the surface processing.
影响因子：
64.8
作者：
Aeschlimann, Martin;Bauer, Michael;Steeb, Felix
通讯作者：
Steeb, Felix