Electrochemical Self-Assembly of CuSCN/4-Cyano-4’-(N’-methyl)Stilbazolium Hybrid Thin Films
Electrochemical Self-Assembly of CuSCN/4-Cyano-4’-(N’-methyl)Stilbazolium Hybrid Thin Films
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CuSCN/4-Cyano-4-(N-甲基)芪唑杂化薄膜的电化学自组装
DOI：
10.1149/09707.0457ecst
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发表时间：
2020
期刊：
影响因子：
--
通讯作者：
Yoshida Tsukasa
中科院分区：
文献类型：
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作者：
Tsuda Yuki;Suzuki Toru;Nakamura Tensho;Uda Kyota;Okada Shuji;Yamakado Ryohei;Stadler Philipp;Yoshida Tsukasa
我们对 CuSCN/4-氰基-4'-(N'-甲基)芪唑 (CNS+) 杂化薄膜进行了电化学自组装 (ESA)，并与 CuSCN/4-(N,N-二甲氨基)-4'-(N'-甲基) 芪唑 (DAS+) 杂化体系进行了比较。由于存在强吸电子-CN基团，CNS+具有比DAS+高得多的偶极矩，从而对CuSCN表现出更强的亲和力。因此，CNS+比DAS+的浓度更小，对CuSCN的晶体生长产生了强烈的影响，例如改变晶体取向、创造独特的纳米结构以及从β-CuSCN到α-CuSCN的相变。已发现 CNS+ 在加载到薄膜中遵循与 DAS+ 相同的机制。扩散限制负载的极限被推升至 200 mol dm-3 的本体浓度，远高于 DAS+（60 mol dm-3）的本体浓度。此外，由于 CuSCN/CNS 表面复合物稳定性的提高，表面反应限制负载中的染料吸收效率提高了约 3 倍。
Electrochemical self-assembly (ESA) of CuSCN/4-cyano-4’-(N’-methyl) stilbazolium (CNS+) hybrid thin films has been performed and analyzed in comparison with CuSCN/4-(N, N-dimethylamino)-4’-(N’-methyl) stilbazolium (DAS+) hybrid system. Due to the presence of strongly electron-withdrawing-CN group, CNS+ has a much higher dipole moment than DAS+ to exhibit stronger affinity to CuSCN. CNS+ therefore gave strong impact to the crystal growth of CuSCN with its smaller concentration than DAS+, such as changing crystal orientation, creating unique nanostructure and phase transition from β-to α-CuSCN. CNS+ has been found to obey the same mechanism as DAS+ for its loading into the film. The limit for diffusion limited loading was pushed up to its bulk concentration of 200 mol dm-3, much higher than that for DAS+(60 mol dm-3). Also, the efficiency of dye uptake in the surface reaction limited loading was enhanced about 3 times due to the improved stability of CuSCN/CNS surface complex.