Real Time Nanoscale Cleaning Phenomenon Observation during PVA Brush Scrubbing by Evanescent Field
Real Time Nanoscale Cleaning Phenomenon Observation during PVA Brush Scrubbing by Evanescent Field
复制标题
倏逝场实时观察 PVA 刷擦洗过程中的纳米级清洁现象
DOI：
10.1149/09202.0191ecst
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发表时间：
2019
期刊：
影响因子：
--
通讯作者：
Hirokuni Hiyama
中科院分区：
文献类型：
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作者：
Yutaka Terayama;P. Khajornrungruang;Keisuke Suzuki;Kohei Kusatsu;Satomi Hamada;Y. Wada;Hirokuni Hiyama
在纳米尺度上，清洁现象被认为是表面附近的纳米粒子行为。这种现象涉及到纳米颗粒从待清洗的晶圆表面去除，以及在cmp后清洗过程中纳米颗粒偶尔重新附着在表面上。然而，晶圆片上的残留污染通常只在清洗过程前后进行检查。因此，纳米颗粒在表面的去除和再附着机理尚不清楚。因此，我们一直在利用内部反射产生的局部光（称为倏逝光）建立表面清洁现象的动态可视化。在本文中，我们通过演示从玻璃表面去除100 nm荧光二氧化硅纳米颗粒，讨论了我们提出的光学方法在PVA刷擦洗过程中实时观察纳米颗粒去除的有效性。因此，纳米颗粒与PVA刷之间的相互擦洗行为将通过荧光和非荧光波长散射光来识别。
Cleaning phenomenon is considered as nano-particle behaviors near the surface in nano-scale. The phenomenon concerns the removal of the nano-particle from the wafer surface to be cleaned, and the occasional reattachment of the nano-particle to surface in Post-CMP cleaning process. However, residual contamination on the wafer has been usually inspected only before and after cleaning process. Therefore, removal and reattachment mechanism of nano-particles on the surface have not already clearly known. Hence, we have been establishing dynamically visualization of cleaning phenomena on the surface applying localized light called evanescent light generated by internal reflection. In this article, we discuss the validity of our proposed optical method to observe nano-particle removal during PVA brush scrubbing in real time, by demonstrating removal of 100 nm fluorescent silica-nano-particles from a glass surface. Consequently, the mutual scrubbing behavior between nano-particles and PVA brush would be identified by fluorescent and non-fluorescent wavelength scattering light.