Diffusion of vanadium, chromium, and manganese in copper
Diffusion of vanadium, chromium, and manganese in copper
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DOI:
10.1007/bf02661758
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发表时间:
1977-03
期刊:
影响因子:
--
通讯作者:
K. Hoshino;Y. Iijima;K. Hirano
中科院分区:
文献类型:
--
作者:
K. Hoshino;Y. Iijima;K. Hirano
The diffusion coefficients of vanadium, chromium and manaanese in copper have been determined by the residual activity method with radioactive tracers V48, Cr51and Mn54in the temperature ranges between 955 and 1342 K, between 999 and 1338 K and between 971 and 1253 K, respectively. The temperature dependence of the diffusion coefficients is expressed by the following Arrhenius equations along with the probable errors:DV/Cu= (2.48-0.44+0.53) x 10−4exp [-(215 ± 2) kJ mol−1/RT] m2per s,DCr/Cu= (0.337-0.090+0.124) x 10−4exp [-(195 ± 3) kJ mol−1/RT] m2per s,DMn/Cu= (1.02-0.18+0.22) x 10−4exp [-(200 ± 2) kJ mol−1/RT] m2per s.Anomalous penetration profiles for the diffusion of Cr51and Mn54in the present results suggest that experimental results onDCr/CuandDMn/Cuin the past have been influenced by oxidation and evaporation of the chemically active radiotracers during annealing for diffusion.