Diffusion of vanadium, chromium, and manganese in copper

Diffusion of vanadium, chromium, and manganese in copper
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DOI:
10.1007/bf02661758
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发表时间:
1977-03
期刊:
Metallurgical Transactions A
影响因子:
--
通讯作者:
K. Hoshino;Y. Iijima;K. Hirano
K. Hoshino;Y. Iijima;K. Hirano
中科院分区:
其他
文献类型:
--
作者:
K. Hoshino;Y. Iijima;K. Hirano

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用放射性示踪剂V_(48)、Cr_(51)和Mn_(54),用剩余活度法分别在955 ~ 1342 K、999 ~ 1338 K和971 ~ 1253 K温度范围内测定了钒、铬和锰在铜中的扩散系数。扩散系数的温度依赖性由下面的阿克里乌斯方程沿着以及可能的误差表示:DV/Cu=(2.48-0.44+0.53)x 10− 4 exp [-(215 ± 2)kJ mol−1/RT] m2 per s,DCr/Cu=(0.337-0.090+0.124)x 10− 4 exp [-(195 ± 3)kJ mol−1/RT] m2 per s,DMn/Cu=(1.02-0.18+0.22)x 10− 4 exp [-(200 ± 2)kJ mol−1/RT] m2 per s.在本研究中,Cr 51和Mn 54扩散的反常穿透剖面表明,在DCr/Cu和DMn/Cu上的实验结果在过去受到扩散退火过程中化学活性放射性示踪剂的氧化和蒸发的影响。
The diffusion coefficients of vanadium, chromium and manaanese in copper have been determined by the residual activity method with radioactive tracers V48, Cr51and Mn54in the temperature ranges between 955 and 1342 K, between 999 and 1338 K and between 971 and 1253 K, respectively. The temperature dependence of the diffusion coefficients is expressed by the following Arrhenius equations along with the probable errors:DV/Cu= (2.48-0.44+0.53) x 10−4exp [-(215 ± 2) kJ mol−1/RT] m2per s,DCr/Cu= (0.337-0.090+0.124) x 10−4exp [-(195 ± 3) kJ mol−1/RT] m2per s,DMn/Cu= (1.02-0.18+0.22) x 10−4exp [-(200 ± 2) kJ mol−1/RT] m2per s.Anomalous penetration profiles for the diffusion of Cr51and Mn54in the present results suggest that experimental results onDCr/CuandDMn/Cuin the past have been influenced by oxidation and evaporation of the chemically active radiotracers during annealing for diffusion.