High-power polarization-engineered GaN/AlGaN/GaN HEMTs without surface passivation
High-power polarization-engineered GaN/AlGaN/GaN HEMTs without surface passivation
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DOI:
10.1109/led.2003.821673
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发表时间:
2004-02
影响因子:
4.9
通讯作者:
Likun Shen;R. Coffie;D. Buttari;S. Heikman;A. Chakraborty;A. Chini;Sarah L. Keller;S. Denbaars;Umesh K. Mishra
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文献类型:
--
作者:
Likun Shen;R. Coffie;D. Buttari;S. Heikman;A. Chakraborty;A. Chini;Sarah L. Keller;S. Denbaars;Umesh K. Mishra
In this paper, a high-power GaN/AlGaN/GaN high electron mobility transistor (HEMT) has been demonstrated. A thick cap layer has been used to screen surface states and reduce dispersion. A deep gate recess was used to achieve the desired transconductance. A thin SiO/sub 2/ layer was deposited on the drain side of the gate recess in order to reduce gate leakage current and improve breakdown voltage. No surface passivation layer was used. A breakdown voltage of 90 V was achieved. A record output power density of 12 W/mm with an associated power-added efficiency (PAE) of 40.5% was measured at 10 GHz. These results demonstrate the potential of the technique as a controllable and repeatable solution to decrease dispersion and produce power from GaN-based HEMTs without surface passivation.