Laser-induced desorption and etching at surfaces
Laser-induced desorption and etching at surfaces
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激光诱导表面解吸和蚀刻
DOI：
10.1016/0169-4332(94)90383-2
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发表时间：
1994
影响因子：
6.7
通讯作者：
Y. Murata
中科院分区：
文献类型：
--
作者：
Moon;M. Suguri;K. Fukutani;F. Komori;Y. Murata
研究了纳秒脉冲紫外激光在Pt（111）表面化学吸附NO分子的解吸和氯化Si(111)7 × 7表面的蚀刻。用反射-吸收红外光谱法观察了激光照射前后吸收NO分子的拉伸-振动光谱，用共振增强多光子电离法检测了解吸中性NO分子。另一方面，用扫描隧道显微镜观察了激光照射氯化Si(111)7 × 7表面前后表面结构的变化。Pt（111）表面的NO脱附和氯化Si(111)7 × 7表面的蚀刻均具有较高的反应选择性。
Desorption of NO molecules chemisorbed on a Pt(111) surface and etching of a chlorinated Si(111)7 × 7 surface induced by a nanosecond-pulsed ultraviolet laser have been studied. NO stretching-vibration spectra of absorbed NO molecules have been observed with reflection-absorption infrared spectroscopy before and after laser irradiation, and desorbed neutral NO molecules have been detected using the resonance-enhanced multiphoton ionization method. On the other hand, the change in the surface structure before and after laser irradiation on the chlorinated Si(111)7 × 7 surface has been observed with a scanning tunnelling microscope. High reaction selectivities were found in both the NO desorption from the Pt(111) surface and the etching of the chlorinated Si(111)7 × 7 surface.