Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method
Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method
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DOI：
10.3390/pr9010002
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发表时间：
2020-12
期刊：
影响因子：
3.5
通讯作者：
S. Hwang;K. Koga;Y. Hao;P. Attri;T. Okumura;K. Kamataki;N. Itagaki;M. Shiratani;Jun‐Seok Oh;Susumu Takabayashi;T. Nakatani
中科院分区：
文献类型：
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作者：
S. Hwang;K. Koga;Y. Hao;P. Attri;T. Okumura;K. Kamataki;N. Itagaki;M. Shiratani;Jun‐Seok Oh;Susumu Takabayashi;T. Nakatani
随着纳米技术应用的不断增加，对尺寸可控纳米颗粒的需求也在增加。因此，在本工作中，我们对Ar+CH4多空心放电等离子体中碳纳米颗粒的生长机理进行了探讨。利用等离子体，我们成功地利用气流连续生成了尺寸可控(25-220 nm)的氢化非晶态碳纳米颗粒。在等离子体中纳米粒子的生长过程中，我们证实了碳相关自由基的沉积是该方法的主要过程。纳米颗粒的大小与气体在放电电极孔中的停留时间成正比。自由基沉积在放电过程中形成了成核纳米颗粒，放电中的飞行时间控制了纳米颗粒的大小。
As the application of nanotechnology increases continuously, the need for controlled size nanoparticles also increases. Therefore, in this work, we discussed the growth mechanism of carbon nanoparticles generated in Ar+CH4 multi-hollow discharge plasmas. Using the plasmas, we succeeded in continuous generation of hydrogenated amorphous carbon nanoparticles with controlled size (25–220 nm) by the gas flow. Among the nanoparticle growth processes in plasmas, we confirmed the deposition of carbon-related radicals was the dominant process for the method. The size of nanoparticles was proportional to the gas residence time in holes of the discharge electrode. The radical deposition developed the nucleated nanoparticles during their transport in discharges, and the time of flight in discharges controlled the size of nanoparticles.