Microstructure and mechanical properties of (AlTi)xN1-x films by magnetic-field-enhanced high power impulse magnetron sputtering
Microstructure and mechanical properties of (AlTi)xN1-x films by magnetic-field-enhanced high power impulse magnetron sputtering
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DOI：
10.1116/1.4971202
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发表时间：
2017-03
期刊：
影响因子：
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通讯作者：
X. Tian;Yinghe Ma;Jian Hu;M. Bi;C. Gong;P. Chu
中科院分区：
文献类型：
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作者：
X. Tian;Yinghe Ma;Jian Hu;M. Bi;C. Gong;P. Chu
与传统的直流磁控溅射相比，高功率脉冲磁控溅射（HiPIMS）产生了更高的等离子体活性，可以用来沉积具有理想微观结构和更高临界负载的薄膜，但在实际应用中，大部分电子没有得到有效利用而丢失在阳极（腔壁）上。为了获得更高的离子通量和更致密的薄膜微观结构，引入了外磁场。在我们的HiPIMS系统中，磁控管目标周围的线圈会产生更大的增强效应，如果适当的电流流过线圈以增强和限制辉光放电，则基片电流可以增加2倍或更多。采用磁场增强HiPIMS技术制备的（AlTi）xN1-x薄膜表面光滑，表面硬度等力学性能较好，线圈电流大，摩擦小。这种改进归因于增强的辉光放电，…
Compared to conventional direct current magnetron sputtering, high power impulse magnetron sputtering (HiPIMS) gives rise to higher plasma activity which can be exploited to deposit films with the preferred microstructure and higher critical load, but in practice, most of the electrons are not effectively utilized and lost to the anode (chamber wall). In order to achieve higher ion flux to substrate and denser microstructure of the films, an external magnetic field is introduced. In our HiPIMS system, a coil around the magnetron target induces larger enhancement effects, and the substrate current can be increased by a factor of 2 or more if the proper current flows through the coil to intensify and confine the glow discharge. The magnetic-field-enhanced HiPIMS technology is adopted to produce (AlTi)xN1-x films with smooth surfaces and better mechanical properties such as surface hardness and a larger coil current produces films with lower friction. The improvement is attributed to enhanced glow discharge,...