Atomic Mechanism in Layer-by-Layer Growth via Surface Reconstruction
Atomic Mechanism in Layer-by-Layer Growth via Surface Reconstruction
复制标题
通过表面重构逐层生长的原子机制
DOI：
10.1021/acs.nanolett.9b01934
复制
发表时间：
2019
期刊：
影响因子：
10.8
通讯作者：
Wang Yong
中科院分区：
文献类型：
--
作者：
Yu Jian;Li Xiao-Yan;Miao Junjian;Yuan Wentao;Zhou Shihui;Zhu Beien;Gao Yi;Yang Hangsheng;Zhang Ze;Wang Yong
逐层生长在新材料和器件的精细设计中起着至关重要的作用。虽然在材料合成过程中对其进行了广泛的研究，但由于缺乏在原子尺度上的直接观察，其生长的原子机制尚不清楚。在这里，我们报告了一种新的模式，通过环境透射电子显微镜和密度泛函理论计算，通过MoO2（011）的表面重建逐层生长。我们的原位环境透射电镜结果表明，moo2的逐层生长经历了两个步骤，以振荡的方式发生：(1)通过将重构层的一部分转化为本征面层而形成原子边缘，然后(2)新形成的本征面层的自发重建。因此，表面重构可以看作是MoO2逐层生长过程中的一个中间阶段。在moo2溶解过程中也观察到类似的现象。
Layer-by-layer growth played a critical role in the fine design of novel materials and devices. Although it has been widely studied during materials synthesis, the atomic mechanism of the growth remains unclear due to the lack of direct observation at the atomic scale. Here, we report a new mode in layer-by-layer growth via surface reconstruction on MoO2(011) by environmental transmission electron microscopy and density functional theory calculations. Our in situ environmental transmission electron microscopy results demonstrate that the layer-by-layer growth of MoO2experiences two steps that occur in an oscillatory manner: (1) the formation of an atomic ledge by transforming a section of the reconstructed layer to the intrinsic surface layer and then (2) the spontaneous reconstruction of the newly formed intrinsic surface section. Thus, the surface reconstruction can be considered as an intermediated phase during the layer-by-layer growth of MoO2. A similar phenomenon was also observed in the MoO2dissolution procedure.