Single-shot soft x-ray laser-induced ablative microstructuring of organic polymer with demagnifying projection.
Single-shot soft x-ray laser-induced ablative microstructuring of organic polymer with demagnifying projection.
复制标题
具有缩小投影的单次软 X 射线激光诱导有机聚合物烧蚀微结构。
DOI：
10.1364/ol.33.001087
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发表时间：
2008
期刊：
影响因子：
3.6
通讯作者：
J. Chalupský
中科院分区：
文献类型：
--
作者：
T. Mocek;B. Rus;M. Kozlová;J. Polan;P. Homer;L. Juha;V. Hájková;J. Chalupský
我们报告了一个单次拍摄的有机聚合物的微图案化，通过使用类氖锌21.2 nm软X射线激光与缩小投影烧蚀实现。将周期为100微米的镍网缩小约10倍，并通过直接烧蚀压印在聚（甲基丙烯酸甲酯）上。烧蚀的微结构的质量被发现主要取决于投影掩模的质量。这第一次演示（据我们所知）的单次投影，单步光刻说明了软X射线激光器的直接图案化的材料与分辨率可扩展到亚微米域的潜力。
We report on a single-shot micropatterning of an organic polymer achieved by ablation with demagnifying projection using a Ne-like Zn 21.2 nm soft x-ray laser. A nickel mesh with a period of 100 microm was approximately 10x demagnified and imprinted on poly(methyl methacrylate) via direct ablation. The quality of the ablated microstructure was found to be mainly dependent on the quality of the projected mask. This first demonstration (to our knowledge) of single-shot projection, single-step lithography illustrates the potential of soft x-ray lasers for the direct patterning of materials with a resolution scalable down to submicrometer domain.