UV radiation enhanced oxygen vacancy formation caused by the PLD plasma plume.
UV radiation enhanced oxygen vacancy formation caused by the PLD plasma plume.
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DOI：
10.1038/s41598-018-27207-5
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发表时间：
2018-06-11
影响因子：
4.6
通讯作者：
Dittmann R
中科院分区：
文献类型：
--
作者：
Hensling FVE;Keeble DJ;Zhu J;Brose S;Xu C;Gunkel F;Danylyuk S;Nonnenmann SS;Egger W;Dittmann R
脉冲激光沉积是一种常用的非平衡物理沉积技术，用于生长复合氧化物薄膜。已知影响所用样品和薄膜的性质的参数范围很广，特别是氧空位浓度。到目前为止，由于在生长过程中将其影响与撞击物种的影响分离的挑战，一个参数被忽略了：等离子体羽流的UV辐射。我们在这里提出的实验，使一个专门设计的保持器，允许这两个影响的分离。研究了脉冲激光沉积过程中紫外光照射对钙钛矿结构模型材料SrTiO 3中氧空位形成的影响。紫外光辐照样品的载流子浓度随深度和时间的变化几乎是恒定的。相比之下，未暴露于羽流辐射的样品显示出深度依赖性和浓度随时间的减少。我们揭示了增加钛空位氧空位复合物的紫外线照射的样品，与不同的载流子浓度一致。我们发现紫外光增强的氧空位掺入率的负责机制。我们提供了一个完整的图片的另一个影响参数在脉冲激光沉积过程中要考虑的，并解开背后的持久性光电导SrTiO 3的机制。
Pulsed Laser Deposition is a commonly used non-equilibrium physical deposition technique for the growth of complex oxide thin films. A wide range of parameters is known to influence the properties of the used samples and thin films, especially the oxygen-vacancy concentration. One parameter has up to this point been neglected due to the challenges of separating its influence from the influence of the impinging species during growth: the UV-radiation of the plasma plume. We here present experiments enabled by a specially designed holder to allow a separation of these two influences. The influence of the UV-irradiation during pulsed laser deposition on the formation of oxygen-vacancies is investigated for the perovskite model material SrTiO3. The carrier concentration of UV-irradiated samples is nearly constant with depth and time. By contrast samples not exposed to the radiation of the plume show a depth dependence and a decrease in concentration over time. We reveal an increase in Ti-vacancy–oxygen-vacancy-complexes for UV irradiated samples, consistent with the different carrier concentrations. We find a UV enhanced oxygen-vacancy incorporation rate as responsible mechanism. We provide a complete picture of another influence parameter to be considered during pulsed laser depositions and unravel the mechanism behind persistent-photo-conductivity in SrTiO3.
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DOI：
10.1007/978-0-387-85695-7_2
发表时间：
2009-01-01
期刊：
SAPPHIRE: MATERIAL, MANUFACTURING, APPLICATIONS
影响因子：
--
作者：
通讯作者：
--
影响因子：
3.7
作者：
Keeble, D. J.;Mackie, R. A.;Jackson, T. J.
通讯作者：
Jackson, T. J.
影响因子：
6.1
作者：
Andrae, Michael;Dvorak, Filip;Waser, Rainer
通讯作者：
Waser, Rainer
影响因子：
4
作者：
Gunkel, F.;Hoffmann-Eifert, S.;Waser, R.
通讯作者：
Waser, R.
影响因子：
3.9
作者：
Leonhardt, M;De Souza, RA;Maier, J
通讯作者：
Maier, J