Electrostatic fluctuations in a direct current magnetron sputtering plasma
Electrostatic fluctuations in a direct current magnetron sputtering plasma
复制标题
直流磁控溅射等离子体中的静电波动
DOI：
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发表时间：
2001
期刊：
影响因子：
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通讯作者：
V. Antoni
中科院分区：
文献类型：
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作者：
E. Martines;R. Cavazzana;G. Serianni;M. Spolaore;L. Tramontin;M. Zuin;V. Antoni
静电波动（高达500 kHz）已研究了在平面直流磁控管装置使用朗缪尔探针测量浮动电位和离子饱和电流。在磁阱内部发现了高达30%的波动水平。两点光谱分析表明，波动是由于相干模式与低方位角的模式数。仅当放电功率和中性气体压力高于阈值时，才存在模式。当中性气体压力升高时，它们的频率间隔减小，因此增加压力导致更湍流的状态。这些模被解释为不稳定的E×B/密度梯度模。
Electrostatic fluctuations (up to 500 kHz) have been studied in a planar dc magnetron device using Langmuir probes measuring the floating potential and the ion saturation current. Fluctuation levels as high as 30% have been found inside the magnetic trap. A two-point spectral analysis has shown that the fluctuations are due to coherent modes with a low azimuthal mode number. The modes are present only when the discharge power and the neutral gas pressure are above a threshold. Their frequency spacing decreases when the neutral gas pressure is raised, so that increasing the pressure leads to a more turbulent state. The modes have been interpreted as unstable E×B/density gradient modes.