Electroless Plating through Successive Pretreatment with Aminosilane and PdCl2

Electroless Plating through Successive Pretreatment with Aminosilane and PdCl2
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通过氨基硅烷和 PdCl2 连续预处理进行化学镀

DOI：
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发表时间：
1989
期刊：
影响因子：
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通讯作者：
T. Kanbe
T. Kanbe
中科院分区：
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文献类型：
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作者：
T. Hamaya;Y. Kumagai;N. Koshizaki;T. Kanbe

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被引文献

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采用不使用氯化亚锡的新镀镍方法，在玻璃微珠上进行了化学镀镍，该镀镍需经过氨基硅烷和PdCl2的连续预处理。推测在初始阶段形成了金属钯核，并引发了镀。
Electroless nickel deposition on glass beads was carried out by a new plating method without using stannous chloride, which needs a successive pretreatment with aminosilane and PdCl2. It was presumed that metallic palladium nuclei was formed in the initial stage and initiated the plating.