Introduction of amino groups into the interlayer space of graphite oxide using 3-aminopropylethoxysilanes

Introduction of amino groups into the interlayer space of graphite oxide using 3-aminopropylethoxysilanes
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DOI:
10.1016/j.carbon.2007.03.037
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发表时间:
2007-06-01
期刊:
影响因子:
10.9
通讯作者:
Sugie, Y.
Sugie, Y.
中科院分区:
材料科学2区
文献类型:
--
作者:
Matsuo, Y.;Nishino, Y.;Sugie, Y.

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在不同的反应条件下,氧化石墨被3-氨丙基乙氧基硅烷化。3-氨丙基三乙氧基硅烷与氧化石墨反应得到两种层状材料。在较低温度下得到的是层间距为1.27 nm的3-氨丙基三乙氧基硅烷插层的氧化石墨,其中3-氨丙基三乙氧基硅烷的氨基与氧化石墨的羟基键合。在较高的温度下,发生氧化石墨的硅烷化,得到具有1.37 nm的较大层间距的相。氧化石墨被氨基还原成无序碳的过程也同时发生。当3-氨丙基二乙氧基甲基硅烷和3-氨丙基乙氧基二甲基硅烷反应并将它们引入氧化石墨的层间空间时,发生类似的反应。当氧化石墨被3-氨丙基二乙氧基甲基硅烷甲硅烷基化时,在氧化石墨中引入了大量的硅和相应的氨基,因为其对氧化石墨的化学还原的反应性相对低于3-氨丙基三乙氧基硅烷的反应性,并且另外的甲硅烷基化是可能的。可用于化学吸附甲醛的氨基的量达到非常高的值3.8 mmol/g的氧化石墨甲硅烷基化的3-氨丙基二乙氧基甲基硅烷。(c)2007年由Elsevier Ltd.出版
Graphite oxide was silylated by 3-aminopropylethoxysilanes under various reaction conditions. Two types of layered materials were obtained when 3-aminopropyltriethoxysilane was reacted with graphite oxide. One obtained at lower temperatures was 3-aminopropyltriethoxysilane-intercalated graphite oxide with an interlayer spacing of 1.27 nm, in which amino groups of 3-aminopropyltriethoxysilane were bonded to hydroxyl groups of graphite oxide. At higher temperatures, silylation of graphite oxide occurred, giving a phase with larger interlayer spacing of 1.37 nm. Chemical reduction of graphite oxide to disordered carbon by amino groups occurred at the same time. Similar reactions occurred when 3-aminopropyldiethoxymethylsilane and 3-aminopropylethoxydimethylsilane were reacted and they were introduced into the interlayer space of graphite oxide. Large amounts of silicon, and accordingly amino groups, were introduced in graphite oxide when it was silylated by 3-aminopropyldiethoxymethylsilane because its reactivity for chemical reduction of graphite oxide was relatively lower than that of 3-aminopropyltriethoxysilane and additional silylation was possible. The amount of amino groups available for chemical adsorption of formaldehyde reached a very high value of 3.8 mmol/g for graphite oxide silylated by 3-aminopropyldiethoxymethylsilane. (c) 2007 Published by Elsevier Ltd.