Fabrication of a free standing resolution standard for focusing MeV ion beams to sub 30 nm dimensions
Fabrication of a free standing resolution standard for focusing MeV ion beams to sub 30 nm dimensions
复制标题
DOI：
10.1016/j.nimb.2005.01.052
复制
发表时间：
2005-04-01
影响因子：
1.3
通讯作者：
Watt, F
中科院分区：
文献类型：
--
作者：
van Kan, JA;Shao, PG;Watt, F
随着核显微镜的最新进展，质子束写入和MeV离子纳米探针设施的最新发展，具有高度侧壁垂直度的分辨率标准变得越来越重要。我们在这里提出了一种产生高质量独立分辨率标准的方法，该标准可用于卢瑟福背散射光谱法（RBS）、粒子诱导X射线发射（PIXE）等高束流应用，以及二次电子发射等低束流应用。扫描透射离子显微镜（STIM）和离子束感应电流（IBIC）。这些标准允许MeV离子束的快速聚焦，用于高分辨率核显微镜应用以及质子束写入，其中精确的束尺寸的知识对于保证写入纳米结构的再现性至关重要。这个新的标准已被用来测量一维束轮廓与1 MeV的质子，并给出了29.2 nm的FWHM，这是最小的值报告MeV质子在STIM模式。(c)2005 Elsevier B.V.保留所有权利。
With recent advances in nuclear microscopy, proton beam writing and the recent development of MeV ion nano probe facilities it is becoming increasingly important to have resolution standards with a high degree of side wall verticality. We present here a way of producing a high quality free standing resolution standards which can be used for high beam current applications like Rutherford Backscattering Spectrometry (RBS), particle induced X-ray emissions (PIXE), and low beam current applications such as secondary electron emission, scanning transmission ion microscopy (STIM) and ion beam induced current (IBIC). These standards allow rapid focusing of MeV ion beams for high resolution nuclear microscopy applications as well as proton beam writing, where knowledge of the exact beam size is vital to guarantee reproducibility in writing nanostructures. This new standard has been used to measure a one-dimensional beam profile with I MeV protons and gave a FWHM of 29.2 nm which is the smallest value reported for MeV protons in STIM mode. (c) 2005 Elsevier B.V. All rights reserved.