Templating water stains for nanolithography
Templating water stains for nanolithography
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DOI：
10.1021/nl071195c
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发表时间：
2007-08-01
期刊：
影响因子：
10.8
通讯作者：
Cremer, Paul S.
中科院分区：
文献类型：
--
作者：
Liao, Wei-Ssu;Chen, Xin;Cremer, Paul S.
在这里，展示了一种用于在聚合物和金属中创建孪生特征的纳米级图案化技术。该工艺通过将蒸发染色与模板工艺相结合来实现。利用疏水球形模板制备了有序的六角排列双环。环的直径、单个环的宽度以及同心环和相邻环之间的间距可以通过改变溶液条件来调节。通过使用亲水性模板，可以在没有外环的情况下制造阵列。
Herein, a nanoscale patterning technique is demonstrated for creating twin features in polymers and metals. The process works by combining evaporative staining with a templating process. Well-ordered hexagonally arrayed double rings were fabricated using hydrophobic spherical templates. The diameter of the rings, the width of individual rings, and the spacing between concentric and adjacent rings could be tuned by varying the solution conditions. Arrays could be made without the outer ring by employing hydrophilic templates.