Spatial characterization of extreme ultraviolet plasmas generated by laser excitation of xenon gas targets
Spatial characterization of extreme ultraviolet plasmas generated by laser excitation of xenon gas targets
复制标题
激光激发氙气目标产生的极紫外等离子体的空间表征
DOI:
10.1063/1.1532835
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发表时间:
2003
影响因子:
1.6
通讯作者:
K. Mann
中科院分区:
文献类型:
--
作者:
S. Kranzusch;C. Peth;K. Mann
At Laser-Laboratorium Gottingen laser-plasma sources were tested, which are going to be used for characterization of optical components and sensoric devices in the wavelength region from 11 to 13 nm. In all cases extreme ultraviolet (EUV) radiation is generated by focusing a Q-switched Nd:YAG laser into a pulsed gas puff target. By the use of xenon or oxygen as target gas, broadband as well as narrowband EUV radiation is obtained, respectively. Different types of valves and nozzles were tested in order to optimize the emitted radiation with respect to maximum EUV intensities, small source diameters, and positional stability. The investigation of these crucial source parameters was performed with specially designed EUV pinhole cameras, utilizing evaluation algorithms developed for standardized laser beam characterization. In addition, a rotatable pinhole camera was developed which allows both spatially and angular resolved monitoring of the soft x-ray emission characteristics. With the help of this camera ...