Removal of Hg0 from containing‐SO2/NO flue gas by ultraviolet/H2O2 process in a novel photochemical reactor
Removal of Hg0 from containing‐SO2/NO flue gas by ultraviolet/H2O2 process in a novel photochemical reactor
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DOI：
10.1002/aic.14388
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发表时间：
2014-06
期刊：
影响因子：
3.7
通讯作者：
Yangxian Liu;J. Pan;Qian Wang
中科院分区：
文献类型：
--
作者：
Yangxian Liu;J. Pan;Qian Wang
首次开发了一种新型光化学喷雾反应器，并将其用于紫外（UV）/H2 O2法脱除烟气中Hg 0的同时脱除Hg 0/SO2/NO。考察了UV波长、UV功率、H2 O2浓度、Hg 0进口浓度、溶液温度、液气比、溶液pH、SO2浓度、NO浓度和O2浓度等因素对UV/H2 O2工艺去除Hg 0的影响。提出了Hg 0的脱除机理，并对Hg 0、NO和SO2的同时脱除进行了研究。结果表明，紫外光波长、紫外光功率、H2 O2浓度、液气比、溶液pH值、O2浓度等参数对Hg 0. 5的去除效果有显著影响。而Hg 0入口浓度、溶液温度、SO2浓度和NO浓度等参数对Hg 0去除率的影响较小。Hg 0主要通过H2 O2、·OH、· O、O3的氧化和紫外光的光激发作用去除。© 2014美国化学工程师学会AIChE J，60：2275-2285，2014
A novel photochemical spray reactor is first developed and is used to remove Hg0 and simultaneously remove Hg0/SO2/NO from flue gas by ultraviolet (UV)/H2O2 process. The effects of several parameters (UV wavelength, UV power, H2O2 concentration, Hg0 inlet concentration, solution temperature, liquid–gas ratio, solution pH, SO2 concentration, NO concentration, and O2 concentration) on removal of Hg0 by UV/H2O2 process were investigated. Removal mechanism of Hg0 is proposed and simultaneous removal of Hg0, NO, and SO2 is also studied. The results show that the parameters, UV wavelength, UV power, H2O2 concentration, liquid–gas ratio, solution pH, and O2 concentration, have significant impact on removal of Hg0. However, the parameters, Hg0 inlet concentration, solution temperature, SO2 concentration, and NO concentration, only have small effect on removal of Hg0. Hg2+ is the final product of Hg0 removal, and Hg0 is mainly removed by oxidations of H2O2, ·OH, · O, O3, and photoexcitation of UV. © 2014 American Institute of Chemical Engineers AIChE J, 60: 2275–2285, 2014