High-density plasma production for neutralizing negative ion beam
High-density plasma production for neutralizing negative ion beam
复制标题
用于中和负离子束的高密度等离子体生产
DOI:
10.1063/1.1148607
复制
发表时间:
1998
影响因子:
1.6
通讯作者:
T. Kuroda
中科院分区:
文献类型:
--
作者:
M. Tanaka;M. Bacal;M. Sasao;T. Kuroda
An electron cyclotron resonance (ECR) plasma production method using electron cyclotron wave is presented. This method is not subjected to any cutoff-density scaling, and is capable of generating dense plasmas far beyond the critical density of an ordinary wave. It has been demonstrated that a plasma density more than 1013 cm−3 (argon) is obtained with a low frequency (2.45 GHz) and low power (11 kW) microwave. The experimental results and the application to plasma neutralizer are described. The experimental verification of superpermeability of Nb membrane in a plasma environment is in progress to develop a plasma neutralizer with Nb-membrane wall. The design parameters of Nb-membrane pump are presented.