Production of Predominantly Anatase Thin Films on Various Grades of Steel and Other Metallic Substrates From TiCl 4 and Ethyl Acetate by Atmospheric Pressure CVD
Production of Predominantly Anatase Thin Films on Various Grades of Steel and Other Metallic Substrates From TiCl 4 and Ethyl Acetate by Atmospheric Pressure CVD
复制标题
采用常压 CVD 方法用 TiCl 4 和乙酸乙酯在各种等级的钢和其他金属基材上生产以锐钛矿为主的薄膜
DOI:
10.1002/cvde.201106964
复制
发表时间:
2012
影响因子:
--
通讯作者:
Cross A
中科院分区:
文献类型:
--
作者:
Cross A
TiO2thin films are deposited by atmospheric pressure (AP)CVD of TiCl4and ethyl acetate on various substrates heated to 500 °C. The substrates investigated are four different grades of stainless steel (304, 304L, 316, and 316L), titanium metal, gold‐coated titanium metal, and gold‐coated stainless steel (316 grade). The TiO2films are analyzed by Raman spectroscopy (RS) to determine the percentage of anatase present. Predominantly anatase films are produced on all the substrates, demonstrating the versatility of this method. Scanning electron microscopy (SEM) images reveal a marked difference in particle size between regions of high anatase content and lower anatase content, indicative of a difference in growth rate between anatase and rutile particles. Selected samples are shown to be photocatalytically active by degradation of resazurin dye by UV light. The rate of degradation is significantly faster than on the self‐cleaning Saint Gobain Bioclean™.