The mechanical properties evaluation of the CrN coatings deposited by the pulsed DC reactive magnetron sputtering
The mechanical properties evaluation of the CrN coatings deposited by the pulsed DC reactive magnetron sputtering
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DOI：
10.1016/j.surfcoat.2005.07.047
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发表时间：
2006-02
影响因子：
5.4
通讯作者：
Jyh-Wei Lee;Shih-Kang Tien;Yu-Chu Kuo;Chih-Ming Chen
中科院分区：
文献类型：
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作者：
Jyh-Wei Lee;Shih-Kang Tien;Yu-Chu Kuo;Chih-Ming Chen
采用双极对称脉冲直流反应磁控溅射工艺，在不同的溅射温度和脉冲偏压下制备了氮化铬涂层。靶功率和衬底偏压的脉冲频率分别保持在2kHz和50 kHz。采用纳米压痕仪、划痕试验和Daimler-Benz Rockwell-C附着力试验对CrN涂层的力学性能进行了评价。随着衬底温度的升高和负偏压的施加，CrN薄膜的择优取向由（111）向（200）转变。涂层的硬度和附着力也随着衬底温度和-290 V偏压而增加。在300 °C和-290 V偏压下沉积了硬度为21 GPa、附着性能良好的CrN薄膜。通过双极对称脉冲直流反应磁控溅射工艺，获得了具有良好附着性能的CrN薄膜。
The chromium nitride coatings have been deposited by the bipolar symmetric pulsed DC reactive magnetron sputtering process at different temperature and pulse substrate bias. The pulse frequencies of target power and the substrate bias were kept at 2 kHz and 50 kHz, respectively. The nanoindenter, scratch and Daimler-Benz Rockwell-C adhesion tests were adopted to evaluate the mechanical properties of the CrN coatings. The preferred orientation of the CrN coatings changed from (111) to (200) with increasing substrate temperature and negative bias voltage applied. The hardness and adhesion properties of the coatings also increased with substrate temperature and a −290 V bias voltage. A CrN film with 21 GPa in hardness and good adhesion property was deposited at 300 °C and −290 V bias. It is observed that through the bipolar symmetry pulsed DC reactive magnetron sputtering process, the CrN films with sufficient adhesion performance was achieved in this work.