Reversible switching between superhydrophilicity and superhydrophobicity
Reversible switching between superhydrophilicity and superhydrophobicity
复制标题
DOI:
10.1002/anie.200352565
复制
发表时间:
2004-01-01
影响因子:
16.6
通讯作者:
Zhu, DB
中科院分区:
文献类型:
--
作者:
Sun, TL;Wang, GJ;Zhu, DB
Wettability is a very important property that is governed by both chemical composition and surface structure.[1–9] Recently, the control of surface wettability has aroused great interest because of its wide variety of applications. In general, superhydrophobic surfaces [1–6] with a water contact angle (CA) greater than 1508 can be obtained by controlling the topography of hydrophobic surfaces, while superhydrophilic surfaces with a CA about 08 can be realized through a 3D [7–8] or 2D capillary effect [9] on hydrophilic surfaces. Stimuli-responsive surfaces [10] make it possible to reversibly control the wettability of the surface and has been demonstrated by various methods, including light-irradiation,[11, 12] use of an electric field,[13, 14] thermal treatment [15] and treatment with solvent.[16] However, reversible switching between superhydrophilicity and superhydrophobicity has never been reported. Herein we show the roughness-enhanced thermally responsive wettability of a poly (N-isopropylacrylamide)(PNIPAAm)-modified surface.[17, 18] Reversible switching between superhydrophilicity and superhydrophobicity can be achieved in a narrow temperature range of about 108C, which is considered to result from the combined effect of the chemical variation of the surface, and surface roughness. Such switchable surfaces may have wide applications in functional textiles, intelligent microfluidic switching, controllable drug release, and thermally responsive filters. Surface-initiated atom-transfer radical polymerization [19, 20] was used to fabricate thermally responsive PNI-PAAm thin films [21–24] on both a flat and a rough silicon substrate. Results from atomic force microscopy (AFM) and scanning electron microscopy (SEM) showed that the thickness of the PNIPAAm thin film could be well controlled by the polymerization time. Figure 1 a (left) shows a typical SEM image of a rough substrate that has been modified with a PNIPAAm thin film. Compared with the smooth surface (Figure 1a right) of the flat substrate, the rough substrate exhibits a regular array of square silicon microconvexes (bright squares). The dark lines are microgrooves that are about 6 μm in width and about 5 μm in depth. These microgrooves were generated by a laser cutter (see Experimental Section) on a silicon wafer in a region of about 1 1 cm2. The surface roughness can be adjusted by controlling the spacing between the grooves. In our experiments, different groove spacings of about 31 μm, 18 μm, 8 μm, and 6 μm were selected. The magnified image of the rough surface shows that both microconvexes and microgrooves were also rather rough (Figure 1b). Further magnified SEM images of the silicon microconvexes before (Figure1c) and after (Figure1d) PNIPAAm polymerization show that these