Development of microforming process combined with selective chemical vapor deposition
Development of microforming process combined with selective chemical vapor deposition
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DOI：
10.1051/matecconf/20152109011
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发表时间：
2015
期刊：
影响因子：
--
通讯作者：
Kazushi Koshimizu;Tetsuhide Shimizu;M. Yang
中科院分区：
文献类型：
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作者：
Kazushi Koshimizu;Tetsuhide Shimizu;M. Yang
近几十年来，由于微型零件在电子和医疗领域的广泛应用，微成型受到了广泛关注。为了进一步实现这些微型器件的功能化，生物和医学领域（例如生物传感器）强烈需要具有贵金属和纳米材料的高功能表面。为了实现能够在一个过程中使亚毫米级块体结构变形并构建微米级到纳米级结构的高效制造工艺，本研究提出了一种金属箔微成形与工作材料活性表面选择性化学气相沉积（SCVD）的组合工艺。为了阐明该工艺的可用性，研究了功能材料在钛 (Ti) 活性表面进行 SCVD 的可行性。对铁（Fe）和碳纳米管（CNT）进行CVD，在活性Ti和非活性氧化层的图案化表面上构建CNT。硅衬底上的Ti薄膜和Fe分别用作工作材料和功能材料。碳纳米管仅在钛表面生长。因此，证实了Ti活性表面对CVD过程中Fe颗粒合成的选择性。
Microforming has been received much attention in the recent decades due to the wide use of microparts in electronics and medical purpose. For the further functionalization of these micro devices, high functional surface with noble metals and nanomaterials are strongly required in bio- and medical fields, such as bio-sensors. To realize the efficient manufacturing process, which can deform the submillimeter scale bulk structure and can construct the micro to nanometer scale structures in one process, the present study proposes a combined process of microforming for metal foils with a selective chemical vapor deposition (SCVD) on the active surface of work materials. To clarify the availability of this proposed process, the feasibility of SCVD of functional materials to active surface of titanium (Ti) was investigated. CVD of iron (Fe) and carbon nanotubes (CNTs) which construct CNTs on the patterned surface of active Ti and non-active oxidation layer were conducted. Ti thin films on silicon substrate and Fe were used as work materials and functional materials, respectively. CNTs were grown on only Ti surface. Consequently, the selectivity of the active surface of Ti to the synthesis of Fe particles in CVD process was confirmed.