A Simple Imprint Method for Multi-Tiered Polymer Nanopatterning on Large Flexible Substrates Employing a Flexible Mold and Hemispherical PDMS Elastomer
A Simple Imprint Method for Multi-Tiered Polymer Nanopatterning on Large Flexible Substrates Employing a Flexible Mold and Hemispherical PDMS Elastomer
复制标题
采用柔性模具和半球形 PDMS 弹性体在大型柔性基材上进行多层聚合物纳米图案的简单压印方法
DOI：
10.1002/marc.200700362
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发表时间：
2007
影响因子：
4.6
通讯作者：
Y. Kim
中科院分区：
文献类型：
--
作者：
N. Lee;Y. Kim
本工作报告了一种简单的方法来制作多层聚合物纳米片SU-8的组合压印和光刻。首先，SU-8是压印图案使用聚合物柔性模具与抗粘附涂层，沉积在透明和柔性基板上，在室温下在低压。接下来，通过UV工艺将所得SU-8纳米颗粒通过铬掩模暴露于UV光。移除未暴露的SU-8留下多层结构。半球形聚（二甲基硅氧烷）垫的使用有利于在压印过程中抽空滞留的空气。在SU-8柔性基片上均匀压印出500 nm的线/空间图形，最小线宽为200 nm，并成功形成厚度为300 nm ~ 2 μm的三层结构。
This work reports a facile method to fabricate multi-tiered polymer nanopatterns on SU-8 by the combination of imprint- and photo-lithography. First, SU-8 is imprint patterned using a polymeric flexible mold with an anti-adhesion coating that is deposited on a transparent and flexible substrate, at room temperature under low pressure. Next, the resulting SU-8 nanopatterns are exposed to UV light through a chromium mask by a photolithographic process. Removal of the unexposed SU-8 leaves behind multi-tiered structures. The use of a hemispherical poly(dimethylsiloxane) pad facilitates the evacuation of trapped air during the imprinting process. Line/space patterns of 500 nm with the smallest line width of 200 nm were homogeneously imprint-patterned on SU-8 on a large flexible substrate, and three-tiered structures, ranging in thickness from 300 nm to 2 μm, were successfully formed.