Green Texturing of Multi-crystalline Silicon Wafers using Acid Etching and Ultrasonic
Green Texturing of Multi-crystalline Silicon Wafers using Acid Etching and Ultrasonic
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DOI：
10.4156/jdcta.vol6.issue16.36
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发表时间：
2012-09
期刊：
影响因子：
--
通讯作者：
Yan Chao;Liqun Wu;X. Luo
中科院分区：
文献类型：
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作者：
Yan Chao;Liqun Wu;X. Luo
硅的表面纹理可以降低入射光的反射率，从而提高太阳能电池的转换效率。在硅太阳能电池的纹理化方面已经出现了许多方法。化学湿法刻蚀作为一种实用方法，已广泛应用于单晶硅和多晶硅（mc-Si），但成本和高反射率限制了其广泛应用。本文提出了一种利用混合酸超声织构多晶硅太阳能电池的新方法。超声波在酸性溶液中传播可以诱发空化和空化侵蚀，从而改善多晶硅的织构化，使多晶硅表面产生规则的形貌。为了研究新方法的有效性，设计了混酸与混酸结合超声的对比实验，用相同的样品对多晶硅表面进行织构。采用带有氩弧灯的高速CCD来观察毛化过程中的空化和空蚀。通过扫描电子显微镜（SEM）获得了两个织构化多晶硅样品的形貌图像，观察到该方法具有更多的孔和规则分布的形貌，这是通过酸蚀和空化侵蚀之间的综合蚀刻产生的。采用分光光度计测量多晶硅表面的减反射率，混酸结合超声波织构的多晶硅表面获得了10.2%的反射率，远低于传统酸蚀的反射率。
Surface texturing of silicon can reduce the reflectance of incident light and hence increase the conversion efficiency of solar cells. Many approaches have been present in texturing silicon solar cell. As a practical method, chemical wet etching has been widely used in mono-crystalline silicon and multi-crystalline silicon (mc-Si), but the cost and high reflectance hamper its widely used. In this paper, a new approach is presented by using mixed acid with ultrasonic to texture mc-Si solar cell. Ultrasound transmitted in the acid solution can induce the cavitations and cavitations erosion, which can improve the texturing of mc-Si and yield regular morphology on the surface of mc-Si. In order to study the efficiency of new methods, a comparative experiment between mixed acid and mixed acid combined with ultrasound is designed to texture the surface of mc-Si with the same samples. A highspeed CCD with argon arc lamp is applied to observe the cavitations and cavitations erosion in texturing. The morphology images of the two textured mc-Si samples are obtained by scanning electron microscope (SEM), more holes and regular distributed morphology for the presented method are observed, which is yielded by comprehensive etching between acid and cavitations erosions. A spectrophotometer is used to measure the anti-reflectance of the mc-Si surface, and the reflectance of 10.2% is obtained on the surface of mc-Si textured by mixed acid combined with ultrasonic wave, which is much less than that of traditional acid etching.