Three‐component, negative‐type, alkaline‐developable, thermally stable, and photosensitive polymer based on poly(2,6‐dihydroxy‐1,5‐naphthalene), a crosslinker, and a photoacid generator
Three‐component, negative‐type, alkaline‐developable, thermally stable, and photosensitive polymer based on poly(2,6‐dihydroxy‐1,5‐naphthalene), a crosslinker, and a photoacid generator
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基于聚(2,6-二羟基-1,5-萘)、交联剂和光产酸剂的三组分、负型、碱显影、热稳定、感光聚合物
DOI：
10.1002/pola.20122
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发表时间：
2004
期刊：
影响因子：
--
通讯作者：
M. Ueda
中科院分区：
文献类型：
--
作者：
K. Tsuchiya;Y. Shibasaki;Masato Suzuki;M. Ueda
以聚（2，6-二羟基-1，5-萘）（PDHN）、交联剂4，4 ′-亚甲基双[2，6-二（羟甲基）]苯酚和光生酸剂（5-丙基磺酰氧基亚氨基-5H-噻吩-2-亚基）-（2-甲基苯基）乙腈为原料，合成了一种负性、化学放大型光敏聚合物。以2，6-二羟基萘和二-μ-羟基-双[（N，N，N′，N′-四甲基乙二胺）合铜（II）]为原料，在2-甲氧基乙醇中进行氧化偶联聚合，合成了数均分子量为25，000的PDHN。所得PDHN在氮气中的5%失重温度为440 °C，介电常数低至2.82。该抗蚀剂在436 nm光下曝光后，在100 ℃下进行5分钟的曝光后烘烤，在25 ℃下用2.38重量%的氢氧化四甲铵水溶液进行显影，结果显示出8.3 mJ cm-2的灵敏度和11的对比度。在接触印刷模式下，在暴露于436 nm的10 mJ cm−2紫外光的3 μm厚的膜上获得具有10 μm线和空间图案的精细负像。© 2004 Wiley Periodicals，Inc.聚合物科学杂志A部分：聚合物化学42：2235-2240，2004
A negative working and chemically amplified photosensitive polymer has been developed, which is based on poly(2,6-dihydroxy-1,5-naphthalene) (PDHN), the crosslinker 4,4′-methylenebis[2,6-bis(hydroxymethyl)]phenol, and the photoacid generator (5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-(2-methylphenyl)acetonitrile. PDHN, with a number-average molecular weight of 25,000, was prepared by the oxidative coupling polymerization of 2,6-dihydroxynaphthalene with di-μ-hydroxo-bis[(N,N,N′,N′-tetramethylethylenediamine)copper(II)] chloride in 2-methoxyethanol at room temperature. The resulting PDHN showed a 5% weight loss temperature of 440 °C in nitrogen and a low dielectric constant of 2.82. The resist showed a sensitivity of 8.3 mJ cm−2 and a contrast of 11 when it was exposed to 436-nm light, followed by postexposure baking at 100 °C for 5 min and development with a 2.38 wt % aqueous tetramethylammonium hydroxide solution at 25 °C. A fine negative image featuring 10-μm line-and-space patterns was obtained on a film 3 μm thick exposed to 10 mJ cm−2 of ultraviolet light at 436 nm in the contact-printed mode. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 2235–2240, 2004