High efficiency of photon-to-heat conversion with a 6-layered metal/dielectric film structure in the 250-1200 nm wavelength region.
High efficiency of photon-to-heat conversion with a 6-layered metal/dielectric film structure in the 250-1200 nm wavelength region.
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DOI：
10.1364/oe.22.0a1843
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发表时间：
2014-12
期刊：
影响因子：
3.8
通讯作者：
M. Liu;E. Hu;Yuan Yao;K. Zang;Ning He;Jing Li;Yuxiang Zheng;Songyou Wang;O. Yoshie;YangPak Lee;Cai-Zhuang Wang;David W. Lynch;Liang-Yao Chen
中科院分区：
文献类型：
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作者：
M. Liu;E. Hu;Yuan Yao;K. Zang;Ning He;Jing Li;Yuxiang Zheng;Songyou Wang;O. Yoshie;YangPak Lee;Cai-Zhuang Wang;David W. Lynch;Liang-Yao Chen
本文研究了六层金属/介质膜结构的光学特性和热稳定性。在250-1200 nm的宽光谱范围内，该材料的平均吸收率大于98%，与实验结果吻合较好。样品具有典型的层状结构：SiO2（57.3 nm）/Ti（5.7 nm）/SiO2（67.1 nm）/Ti（11.6 nm）/SiO2（51.4 nm）/Cu（>100 nm），通过磁控溅射沉积在光学抛光的Si或K9玻璃衬底上。6层金属/介质膜结构的样品具有AM1.5G的太阳吸收率为95.5%，具有在700 K下的0.136的低热发射率和良好的热稳定性的特点，并且将潜在地适合于在许多领域中的高效太阳吸收器器件的实际应用。
The optical properties and thermal stability of a 6-layered metal/dielectric film structure are investigated in this work. A high optical absorption average of > 98% is achieved in the broad spectral range of 250-1200 nm with experiment results, in good agreement with our simulated results. The samples have a typical layered structure of: SiO(2)(57.3 nm)/Ti(5.7 nm)/SiO(2) (67.1 nm)/Ti(11.6 nm)/SiO(2)(51.4 nm)/Cu(>100 nm), deposited on optically polished Si or K9-glass substrates by magnetron sputtering. The sample of the 6-layered metal/dielectric film structure has an AM1.5G solar absorptance of 95.5% with the features of low thermal emittance of 0.136 at 700K and good thermal stability, and will be potentially suitable for practical application in high-efficiency solar absorber devices in many fields.