Recent developments in nanofabrication using focused ion beams
Recent developments in nanofabrication using focused ion beams
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DOI：
10.1002/smil.200500113
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发表时间：
2005-09-01
期刊：
影响因子：
13.3
通讯作者：
Tseng, AA
中科院分区：
文献类型：
--
作者：
Tseng, AA
聚焦离子束（FIB）技术在纳米级结构的制造中变得越来越流行。在本文中，研究了 FIB 技术的最新发展，重点是其制造各种纳米结构的能力。基于FIB的纳米加工涉及四种主要方法：铣削、注入、离子诱导沉积和离子辅助材料蚀刻；所有这些方法都将单独审查。在介绍该技术的独特性和优势之后，介绍了用于 FIB 的离子源和系统。随后研究了四种方法中每种方法的原理和具体技术，重点是它们以纳米级精度写入结构的能力。还讨论了这些技术之间的差异和独特性。最后，总结了所研究技术的优点和缺点，并提出了技术改进和未来研究的范围。
Focused ion beam(FIB) technology has become increasingly popular in the fabrication of nanoscale structures. In this paper, the recent developments Of the FIB technology are examined with emphasis on its ability to fabricate a wide variety of nanostructures. FIB-based nanofabrication involves four major approaches: milling, implantation, ion-induced deposition, and ion-assisted etching of materials; all these approaches are reviewed separately. Following an introduction of the uniqueness and strength of the technology, the ion source and systems used for FIB are presented. The principle and specific techniques underlying each of the four approaches are subsequently studied with emphasis on their abilities of writing structures with nanoscale accuracy. The differences and uniqueness among these techniques are also discussed. Finally, concluding remarks are provided where the strength and weakness of the techniques studied are summarized and the scopes for technological improvement and future research are recommended.