Effect of chemical stress on diffusion in a hollow cylinder
Effect of chemical stress on diffusion in a hollow cylinder
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DOI：
10.1063/1.1477624
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发表时间：
2002-05
影响因子：
3.2
通讯作者：
W. .. Wang;Sanboh Lee;J. R. Chen
中科院分区：
文献类型：
--
作者：
W. .. Wang;Sanboh Lee;J. R. Chen
本文研究了平面应变和零轴向力条件下化学应力对空心圆柱内扩散的影响。研究了恒表面应力和恒表面势两种扩散过程。无论是平面应变还是零轴向力，化学应力对恒表面势扩散过程的影响与恒表面应力扩散过程的影响相似。化学应力增强扩散系数和浓度。对于给定的时间，对于给定FXf的恒定表面电势和给定FXi的恒定表面应力，外半径与内半径的比率越大，浓度水平越低。F= 2 EV/[9（1−v）RT]其中E、V、R和T分别是杨氏模量、偏摩尔体积、气体常数和绝对温度; Xi和Xf是边界表面处的初始和最终摩尔分数。本文还研究了平面应变和零轴向力条件下化学应力对空心圆柱内扩散的影响。研究了恒表面应力和恒表面势两种扩散过程。无论是平面应变还是零轴向力，化学应力对恒表面势扩散过程的影响与恒表面应力扩散过程的影响相似。化学应力增强扩散系数和浓度。对于给定的时间，对于给定FXf的恒定表面电势和给定FXi的恒定表面应力，外半径与内半径的比率越大，浓度水平越低。F= 2 EV/[9（1−v）RT]其中E、V、R和T分别是杨氏模量、偏摩尔体积、气体常数和绝对温度; Xi和Xf是边界表面处的初始和最终摩尔分数。并与文献报道的薄板和实心圆柱体中的结果进行了比较。
The effect of chemical stress on diffusion in a hollow cylinder for plane strain and zero axial force has been investigated. Two diffusion processes of constant surface stress and constant surface potential are studied. No matter what the plane strain or zero axial force is the influence of chemical stress on the diffusion process of constant surface potential is similar to that of constant surface stress. Chemical stress enhances both the diffusion coefficient and the concentration. For a given time, the level of concentration becomes lower with a greater ratio of outer radius to inner radius for constant surface potential with given FXf and for constant surface stress with given FXi. F=2EV/[9(1−v)RT] where E, V, R, and T are the Young’s modulus, partial molal volume, gas constant, and absolute temperature, respectively; Xi and Xf are the initial and final mole fractions at boundary surfaces. The results are also compared with those in thin plates and solid cylinders reported in the literature.The effect of chemical stress on diffusion in a hollow cylinder for plane strain and zero axial force has been investigated. Two diffusion processes of constant surface stress and constant surface potential are studied. No matter what the plane strain or zero axial force is the influence of chemical stress on the diffusion process of constant surface potential is similar to that of constant surface stress. Chemical stress enhances both the diffusion coefficient and the concentration. For a given time, the level of concentration becomes lower with a greater ratio of outer radius to inner radius for constant surface potential with given FXf and for constant surface stress with given FXi. F=2EV/[9(1−v)RT] where E, V, R, and T are the Young’s modulus, partial molal volume, gas constant, and absolute temperature, respectively; Xi and Xf are the initial and final mole fractions at boundary surfaces. The results are also compared with those in thin plates and solid cylinders reported in the literature.