Prism-Based Laser Interference Lithography System for Simple Multibeam Interference Lithography
Prism-Based Laser Interference Lithography System for Simple Multibeam Interference Lithography
复制标题
用于简单多光束干涉光刻的基于棱镜的激光干涉光刻系统
DOI：
10.1166/sam.2020.3650
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发表时间：
2020
期刊：
影响因子：
--
通讯作者：
B. Shin
中科院分区：
文献类型：
--
作者：
Jun Han Park;D. Yun;Yong;C. Gwak;B. Shin
激光干涉光刻技术是一种强大的亚波长尺度成像技术。然而，这种技术需要一个复杂的光学系统，其精确控制和复杂性随着光束数量的增加呈指数增长。本研究采用紧凑型棱镜为主
Laser interference lithography is a powerful technique of subwavelength-scale patterning. However, this technique requires a complicated optical system, the precise control and complexity of which increases exponentially with increasing number of beams. In this study, a compact prism-based
laser interference lithography system using optical fibers and a prism was proposed to simplify the technique. In this system, the beam splitter and mirrors in a typical laser interference lithography system were replaced by a designed prism, and the pattern could be easily changed by only
changing the prism, without other modification, irrespective of the number of beams required. In addition, because the laser and the laser interference lithography system are connected by an optical fiber, the system can be moved easily and flexibly. The fabrication of various submicroscale
line patterns, holes, and dot patterns with a 270–1400 nm pitch was achieved using the proposed laser interference lithography system.