Microstructure and mechanical properties of VN/SiO2 nanomultilayers synthesized by reactive sputtering
Microstructure and mechanical properties of VN/SiO2 nanomultilayers synthesized by reactive sputtering
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DOI：
10.1016/j.matlet.2007.09.040
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发表时间：
2008-04
影响因子：
3
通讯作者：
Jian-ling Yue;Wenjie Zhao;Geyang Li;Wei Gao
中科院分区：
文献类型：
--
作者：
Jian-ling Yue;Wenjie Zhao;Geyang Li;Wei Gao
采用反应溅射法制备了不同SiO2和VN层厚度的VN/SiO2纳米多层膜。研究了SiO2薄膜的晶化条件及其对多层膜性能的影响。结果表明，在VN/SiO2纳米多层膜中，在VN层的模板作用下，非晶SiO2以很薄的厚度（<100 nm）晶化，然后与VN层一起外延生长。这导致硬度显著增加。随着SiO2层厚度的增加，SiO2层逐渐转变为非晶结构，阻碍多层膜的外延生长，导致多层膜的硬度迅速下降。另一方面，多层膜的硬度对VN层厚度不敏感。
VN/SiO2nanomultilayers with various individual SiO2and VN layer thickness were prepared by reactive sputtering process. The crystallization condition of the SiO2layers and how they influence the characteristics of the multilayers were studied. The results reveal that under the template effect of the crystalline VN layer, as-deposited amorphous SiO2crystallizes at very low thickness (<∼1 nm), and then grows epitaxially with VN layer in the VN/SiO2nanomultilayers. This leads to a remarkable increase in hardness. If the SiO2layers' thickness is further increased, they gradually transform into amorphous structure and block the epitaxial growth of the multilayers, resulting in a quick decline in hardness. On the other hand, the hardness of the multilayers is not sensitive to the VN layer thickness.