Decay of an Island on a Facet via Surface Diffusion
Decay of an Island on a Facet via Surface Diffusion
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通过表面扩散在面上进行岛的衰变
DOI：
10.1143/jpsj.69.497
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发表时间：
2000
影响因子：
1.7
通讯作者：
Katsuhiro Watanabe
中科院分区：
文献类型：
--
作者：
M. Uwaha;Katsuhiro Watanabe
本文通过对一个简单模型的数值积分和理论分析，研究了在小平面上形成的小岛的衰变过程。弛豫通过表面扩散进行，而没有原子的蒸发和碰撞。岛顶部的台阶由于台阶张力而收缩，并且出现小刻面。刻面的尺寸随时间的幂函数R f τ ν而增加，其中指数ν取决于初始形状和速率限制过程。在动力学限制的情况下，步骤聚束发生从底部和扩大的小平面停止在某个阶段。束流速度和岛的轮廓的解析表达式。
We study the decay process of a small island formed on a facet by numerical integration of a simple model and by theoretical analysis. The relaxation proceeds via surface diffusion without evaporation and impingement of atoms. Steps on the top of the island shrink due to the step tension and a small facet appears. The size of the facet increases as the power of time R f ∼ t ν , where the exponent ν depends on the initial shape and the rate limiting process. In the kinetics-limited case, step bunching occurs from the bottom and the enlargement of the facet stops at some stage. Analytical expressions for the bunch velocity and the island profile are found.